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A review of the scalable nano-manufacturing technology for flexible devices
Wenbin HUANG,Xingtao YU,Yanhua LIU,Wen QIAO,Linsen CHEN
Frontiers of Mechanical Engineering 2017, Volume 12, Issue 1, Pages 99-109 doi: 10.1007/s11465-017-0416-3
Recent advances in electronic and photonic devices, such as artificial skin, wearable systems, organic and inorganic light-emitting diodes, have gained considerable commercial and scientific interest in the academe and in industries. However, low-cost and high-throughput nano-manufacturing is difficult to realize with the use of traditional photolithographic processes. In this review, we summarize the status and the limitations of current nano-patterning techniques for scalable and flexible functional devices in terms of working principle, resolution, and processing speed. Finally, several remaining unsolved problems in nano-manufacturing are discussed, and future research directions are highlighted.
Keywords: flexible nano-manufacturing flexible devices nanofabrication scalability
Athanasios Smyrnakis, Angelos Zeniou, Kamil Awsiuk, Vassilios Constantoudis, Evangelos Gogolides
Frontiers of Chemical Science and Engineering 2019, Volume 13, Issue 3, Pages 475-484 doi: 10.1007/s11705-019-1809-0
Keywords: plasma nanoassembly etching nanodots nanopillars nanofabrication
Mechanism and development of dip-pen nanolithography (DPN)
Jiang Hongkui,Yao Tangwei,Hu Liguang,Shen Yaqiang,Yu Xianwen
Strategic Study of CAE 2008, Volume 10, Issue 7, Pages 173-179
Dip-pen nanolithography is a new kind of scanning probe lithography (SPL) technique based on atomic force microscopy (AFM) , and now has made a great progress. The process of dip pen lithography involves the adsorption of ink molecules on AFM tip,the formation of water meniscus,the transport of ink molecules,and diffusion of ink molecules on the substrate.More factors such as temperature,humidity,tip,scanning speed and so on will influence the process of dip pen lithography. The paper detailed analyzed the mechanism of this technique, integrated introduced the latest development, including electrochemical DPN, more-mode DPN,multiple DPN, multi-probe array DPN and so on. Finally, the paper described the characteristics and its application.
Keywords: dip-pen nanolithography atomic force microscopy nanofabrication
High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens Article
Yueqiang Hu, Ling Li, Rong Wang, Jian Song, Hongdong Wang, Huigao Duan, Jiaxin Ji, Yonggang Meng
Engineering 2021, Volume 7, Issue 11, Pages 1623-1630 doi: 10.1016/j.eng.2020.08.019
Keywords: Nanofabrication Surface plasmon polariton Lithography Plasmonic flying head Plasmonic lens
Title Author Date Type Operation
A review of the scalable nano-manufacturing technology for flexible devices
Wenbin HUANG,Xingtao YU,Yanhua LIU,Wen QIAO,Linsen CHEN
Journal Article
A non-lithographic plasma nanoassembly technology for polymeric nanodot and silicon nanopillar fabrication
Athanasios Smyrnakis, Angelos Zeniou, Kamil Awsiuk, Vassilios Constantoudis, Evangelos Gogolides
Journal Article
Mechanism and development of dip-pen nanolithography (DPN)
Jiang Hongkui,Yao Tangwei,Hu Liguang,Shen Yaqiang,Yu Xianwen
Journal Article